XRD Stress analysis of modern nanosized thin films at OC Oerlikon Balzers AG
August 16, 2011
Dr Matthias Sobiech
from OC Oerlikon Balzers AG
XRD stress analysis on modern high performance CrN thin films suitable for tribological applications were perfomed at OC Oerlikon Balzers on a state of the art diffractometer equipped with a FOX 2D Cu 12_INF optic.
This application note demonstrates the capability of a state of the art XRD set-up to perform advanced stress measurements on high performance thin films (stress depth profiling) when equipped with advanced X-ray optics providing a 2 dimensional parallel X-ray beam.
November 4, 2016
Nichole M. Wonderling
Materials Characterization Laboratory, The Pennsylvania State University
October 25, 2016
Dr. José Leobardo Bañuelos
Department of Physics, The University of Texas at El Paso
June 14, 2016
Dr. Oleksandr Mykhaylyk
Department of Chemistry, University of Sheffield, UK
May 13, 2016
Dr Youli Li, Prof. Dimitri Ivanov, Prof. Yongfeng Men
February 29, 2016
Department of Science and Engineering of Oxide Materials and Nanomaterials
Faculty of Applied Chemistry and Materials Science, University POLITEHNICA of Bucharest, Romania.